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Unitized confinement ring arrangements and methods thereof


Title: Unitized confinement ring arrangements and methods thereof.
Abstract: An arrangement for performing pressure control in a plasma processing chamber comprising an upper electrode, a lower electrode, a unitized confinement ring arrangement wherein the upper electrode, the lower electrode and the unitized confinement ring arrangement are configured at least for surrounding a confined chamber region to facilitate plasma generation and confinement therein. The arrangement further includes at least one plunger configured for moving the unitized confinement ring arrangement in a vertical direction to adjust at least one of a first gas conductance path and a second gas conductance path to perform the pressure control, wherein the first gas conductance path is formed between the upper electrode and the unitized confinement ring arrangement and the second gas conductance path is formed between the lower electrode and the single unitized ring arrangement. ...
USPTO Applicaton #: #20110073257
Inventors: Rajinder Dhindsa, Rajaramanan Kalyanaraman, Sathyanarayanan Mani, Gautam Bhattacharyya



The Patent Description & Claims data below is from USPTO Patent Application 20110073257, Unitized confinement ring arrangements and methods thereof.




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stats Patent Info
Application #
US 20110073257 A1
Publish Date
03/31/2011
Document #
12890990
File Date
09/27/2010
USPTO Class
15634526
Other USPTO Classes
15634543
International Class
23F1/08
Drawings
7


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Plasma Generation


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