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Apparatus and methods for using a polishing tape cassetteApparatus and methods for using a polishing tape cassette description/claimsThe Patent Description & Claims data below is from USPTO Patent Application 20090264053, Apparatus and methods for using a polishing tape cassette. Brief Patent Description - Full Patent Description - Patent Application Claims The present application claims priority to U.S. Provisional Patent Application No. 61/046,453, filed Apr. 21, 2008, and entitled, “APPARATUS AND METHODS FOR USING A POLISHING TAPE CASSETTE” (Attorney Docket No. 11533/L), which is hereby incorporated herein by reference in its entirety for all purposes. The present application is also related to the following commonly-assigned, co-pending U.S. patent applications, each of which is hereby incorporated herein by reference in its entirety for all purposes: U.S. patent application Ser. No. 11/299,295 filed on Dec. 9, 2005 and entitled “METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE” (Attorney Docket No. 10121); U.S. patent application Ser. No. 11/298,555 filed on Dec. 9, 2005 and entitled “METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE” (Attorney Docket No. 10414); U.S. patent application Ser. No. 11/693,695 filed on Mar. 29, 2007 and entitled “METHODS AND APPARATUS FOR POLISHING AN EDGE OF A SUBSTRATE” (Attorney Docket No. 10560); U.S. Patent Application Ser. No. 60/939,351, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR POLISHING A NOTCH OF A SUBSTRATE USING AN INFLATABLE POLISHING WHEEL” (Attorney Docket No. 10674/L); U.S. Patent Application Ser. No. 60/939,353, filed May 21, 2007, entitled “METHODS AND APPARATUS TO CONTROL SUBSTRATE BEVEL AND EDGE POLISHING PROFILES OF EPITAXIAL FILMS” (Attorney Docket No. 11417/L); U.S. Patent Application Ser. No. 60/939,219, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR POLISHING A NOTCH OF A SUBSTRATE USING A SHAPED BACKING PAD” (Attorney Docket No. 11483/L); U.S. Patent Application Ser. No. 60/939,342, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR REMOVAL OF FILMS AND FLAKES FROM THE EDGE OF BOTH SIDES OF A SUBSTRATE USING BACKING PADS” (Attorney Docket No. 11564/L); U.S. Patent Application Ser. No. 60/939,350, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR USING A BEVEL POLISHING HEAD WITH AN EFFICIENT TAPE ROUTING ARRANGEMENT” (Attorney Docket No. 11565/L); U.S. Patent Application Ser. No. 60/939,344, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR USING A ROLLING BACKING PAD FOR SUBSTRATE POLISHING” (Attorney Docket No. 11566/L); U.S. Patent Application Ser. No. 60/939,333, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR HIGH PERFORMANCE SUBSTRATE BEVEL AND EDGE POLISHING IN SEMICONDUCTOR MANUFACTURE” (Attorney Docket No. 11809/L); U.S. Patent Application Ser. No. 60/939,212, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR IDENTIFYING A SUBSTRATE EDGE PROFILE AND ADJUSTING THE PROCESSING OF THE SUBSTRATE ACCORDING TO THE IDENTIFIED EDGE PROFILE” (Attorney Docket No. 11695/L); U.S. Patent Application Ser. No. 60/99,228, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR POLISHING A NOTCH OF A SUBSTRATE BY SUBSTRATE VIBRATION” (Attorney Docket No. 11952/L); and U.S. Patent Application Ser. No. 60/939,209, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR CONTROLLING THE SIZE OF AN EDGE EXCLUSION ZONE OF A SUBSTRATE” (Attorney Docket No. 11987/L). The present invention relates generally to electronic device processing, and more particularly to methods and apparatus for using a polishing tape cassette. During electronic device manufacturing, undesirable materials may build up on the edge of a substrate. The materials may include dielectrics, photoresist and metals used in IC manufacture. Therefore, it may be desirable to clean or polish the bevel and outer edge of the substrate to remove these materials to prepare the substrate for electronic (e.g. semiconductor) device manufacturing. Typically an abrasive polishing tape is applied with some degree of force to polish bevels on the edge of the substrate. Generally contact between the abrasive polishing and portions of the substrate reserved for device fabrication (‘device region’) is avoided. Typically, a buffer zone or ‘edge exclusion zone,’ is provided between the device region and the edge of the substrate to protect the device region. Systems, methods and apparatus are needed for efficiently routing and aligning the abrasive tape. Continue reading about Apparatus and methods for using a polishing tape cassette... Full patent description for Apparatus and methods for using a polishing tape cassette Brief Patent Description - Full Patent Description - Patent Application Claims Click on the above for other options relating to this Apparatus and methods for using a polishing tape cassette patent application. ### 1. Sign up (takes 30 seconds). 2. Fill in the keywords to be monitored. 3. Each week you receive an email with patent applications related to your keywords. Start now! - Receive info on patent apps like Apparatus and methods for using a polishing tape cassette or other areas of interest. ### Previous Patent Application: Polishing method and polishing apparatus, and program for controlling polishing apparatus Next Patent Application: Polishing machine, workpiece supporting table pad, polishing method and manufacturing method of semiconductor device Industry Class: Abrading ### FreshPatents.com Support Thank you for viewing the Apparatus and methods for using a polishing tape cassette patent info. IP-related news and info Results in 2.46567 seconds Other interesting Feshpatents.com categories: Qualcomm , Schering-Plough , Schlumberger , Seagate , Siemens , Texas Instruments , paws |
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