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10/22/09 - USPTO Class 451 |  1 views | #20090264053 | Prev - Next | About this Page  451 rss/xml feed  monitor keywords

Apparatus and methods for using a polishing tape cassette

USPTO Application #: 20090264053
Title: Apparatus and methods for using a polishing tape cassette
Abstract: Methods and apparatus are provided for housing a polishing tape adapted to polish a substrate. The invention includes a cassette comprising a body portion; and a head portion, wherein the head portion includes: a pair of guide walls; one or more supply rollers positioned between the guide walls in the head portion; and wherein the guide walls are adapted to guide a polishing tape housed in the body over the one or more supply rollers. Numerous other aspects are provided. (end of abstract)



Agent: Dugan & Dugan, PC - Hawthorne, NY, US
Inventors: Antoine P. Manens, Gary C. Ettinger, Paul D. Butterfield, Shou-Sung Chang, Ricardo Martinez, Eashwer Kollata, Robert A. Ewald, Kuldip Sumbria
USPTO Applicaton #: 20090264053 - Class: 451 59 (USPTO)

Apparatus and methods for using a polishing tape cassette description/claims


The Patent Description & Claims data below is from USPTO Patent Application 20090264053, Apparatus and methods for using a polishing tape cassette.

Brief Patent Description - Full Patent Description - Patent Application Claims
  monitor keywords RELATED APPLICATIONS

The present application claims priority to U.S. Provisional Patent Application No. 61/046,453, filed Apr. 21, 2008, and entitled, “APPARATUS AND METHODS FOR USING A POLISHING TAPE CASSETTE” (Attorney Docket No. 11533/L), which is hereby incorporated herein by reference in its entirety for all purposes.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present application is also related to the following commonly-assigned, co-pending U.S. patent applications, each of which is hereby incorporated herein by reference in its entirety for all purposes:

U.S. patent application Ser. No. 11/299,295 filed on Dec. 9, 2005 and entitled “METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE” (Attorney Docket No. 10121);

U.S. patent application Ser. No. 11/298,555 filed on Dec. 9, 2005 and entitled “METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE” (Attorney Docket No. 10414);

U.S. patent application Ser. No. 11/693,695 filed on Mar. 29, 2007 and entitled “METHODS AND APPARATUS FOR POLISHING AN EDGE OF A SUBSTRATE” (Attorney Docket No. 10560);

U.S. Patent Application Ser. No. 60/939,351, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR POLISHING A NOTCH OF A SUBSTRATE USING AN INFLATABLE POLISHING WHEEL” (Attorney Docket No. 10674/L);

U.S. Patent Application Ser. No. 60/939,353, filed May 21, 2007, entitled “METHODS AND APPARATUS TO CONTROL SUBSTRATE BEVEL AND EDGE POLISHING PROFILES OF EPITAXIAL FILMS” (Attorney Docket No. 11417/L);

U.S. Patent Application Ser. No. 60/939,219, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR POLISHING A NOTCH OF A SUBSTRATE USING A SHAPED BACKING PAD” (Attorney Docket No. 11483/L);

U.S. Patent Application Ser. No. 60/939,342, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR REMOVAL OF FILMS AND FLAKES FROM THE EDGE OF BOTH SIDES OF A SUBSTRATE USING BACKING PADS” (Attorney Docket No. 11564/L);

U.S. Patent Application Ser. No. 60/939,350, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR USING A BEVEL POLISHING HEAD WITH AN EFFICIENT TAPE ROUTING ARRANGEMENT” (Attorney Docket No. 11565/L);

U.S. Patent Application Ser. No. 60/939,344, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR USING A ROLLING BACKING PAD FOR SUBSTRATE POLISHING” (Attorney Docket No. 11566/L);

U.S. Patent Application Ser. No. 60/939,333, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR HIGH PERFORMANCE SUBSTRATE BEVEL AND EDGE POLISHING IN SEMICONDUCTOR MANUFACTURE” (Attorney Docket No. 11809/L);

U.S. Patent Application Ser. No. 60/939,212, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR IDENTIFYING A SUBSTRATE EDGE PROFILE AND ADJUSTING THE PROCESSING OF THE SUBSTRATE ACCORDING TO THE IDENTIFIED EDGE PROFILE” (Attorney Docket No. 11695/L);

U.S. Patent Application Ser. No. 60/99,228, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR POLISHING A NOTCH OF A SUBSTRATE BY SUBSTRATE VIBRATION” (Attorney Docket No. 11952/L); and

U.S. Patent Application Ser. No. 60/939,209, filed May 21, 2007, entitled “METHODS AND APPARATUS FOR CONTROLLING THE SIZE OF AN EDGE EXCLUSION ZONE OF A SUBSTRATE” (Attorney Docket No. 11987/L).

FIELD OF THE INVENTION

The present invention relates generally to electronic device processing, and more particularly to methods and apparatus for using a polishing tape cassette.

BACKGROUND OF THE INVENTION

During electronic device manufacturing, undesirable materials may build up on the edge of a substrate. The materials may include dielectrics, photoresist and metals used in IC manufacture. Therefore, it may be desirable to clean or polish the bevel and outer edge of the substrate to remove these materials to prepare the substrate for electronic (e.g. semiconductor) device manufacturing. Typically an abrasive polishing tape is applied with some degree of force to polish bevels on the edge of the substrate. Generally contact between the abrasive polishing and portions of the substrate reserved for device fabrication (‘device region’) is avoided. Typically, a buffer zone or ‘edge exclusion zone,’ is provided between the device region and the edge of the substrate to protect the device region. Systems, methods and apparatus are needed for efficiently routing and aligning the abrasive tape.



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Previous Patent Application:
Polishing method and polishing apparatus, and program for controlling polishing apparatus
Next Patent Application:
Polishing machine, workpiece supporting table pad, polishing method and manufacturing method of semiconductor device
Industry Class:
Abrading

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