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Exposure apparatus and method for producing deviceExposure apparatus and method for producing device description/claimsThe Patent Description & Claims data below is from USPTO Patent Application 20090262316, Exposure apparatus and method for producing device. Brief Patent Description - Full Patent Description - Patent Application Claims
The present invention relates to an exposure apparatus which exposes a substrate through a liquid, and a method for producing a device. An exposure apparatus, which projects a pattern formed on a mask onto a photosensitive substrate to perform the exposure, is used in the photolithography step as one of the steps of producing microdevices such as semiconductor devices and liquid crystal display devices. The exposure apparatus includes a mask stage which is movable while retaining the mask and a substrate stage which is movable while retaining the substrate. The image of the pattern of the mask is projected onto the substrate via a projection optical system while successively moving the mask stage and the substrate stage. In the microdevice production, it is required to realize a fine and minute pattern to be formed on the substrate in order to achieve a high density of the device. In order to respond to this requirement, it is demanded to realize a higher resolution of the exposure apparatus. A liquid immersion exposure apparatus, in which the optical path space of the exposure light between the projection optical system and the substrate is filled with a liquid to expose the substrate via the projection optical system and the liquid, has been contrived as one of means to realize the high resolution, as disclosed in International Publication No. 99/49504. As for the exposure apparatus, it is demanded to realize a high movement velocity of the substrate (substrate stage) in order to improve, for example, the productivity of the device. However, if the movement velocity is highly increased, there is such a possibility that it is difficult to satisfactorily retain the liquid in the optical path space between the projection optical system and the substrate. For example, when the movement velocity is highly increased, there is such a possibility that the liquid, with which the optical path space is filled, may leak. If the liquid leaks, the following inconvenience arises. That is, for example, any rust and/or any malfunction arises in peripheral members and/or devices, and the environment (for example, humidity and cleanness), in which the exposure apparatus is placed, is fluctuated. It is feared that the exposure accuracy and various measurement accuracies may be deteriorated. The present invention has been made taking the foregoing circumstances into consideration, an object of which is to provide an exposure apparatus which makes it possible to avoid or suppress the leakage of the liquid with which the optical path space of the exposure light is filled, and a method for producing a device based on the use of the exposure apparatus. In order to achieve the object as described above, the present invention adopts the following constructions corresponding to respective drawings as illustrated in embodiments. However, parenthesized symbols affixed to respective elements merely exemplify the elements by way of example, with which it is not intended to limit the respective elements. According to a first aspect of the present invention, there is provided an exposure apparatus (EX) which exposes a substrate (P) by irradiating an exposure light (EL) onto the substrate (P) through a liquid (LQ); the exposure apparatus including a recovery port (22) which recovers the liquid (LQ); a blow port (32) which is provided at the outside of the recovery port (22) with respect to an optical path space (K1) of the exposure light (EL) and which blows a gas therefrom; and a gas discharge port (42) which is provided between the recovery port (22) and the blow port (32) and which discharges at least a part of the gas blown from the blow port (32). According to the first aspect of the present invention, the gas blows from the blow port, and at least a part of the gas blown from the blow port is discharged from the gas discharge port. Accordingly, the predetermined flow of the gas can be generated in the vicinity of the recovery port. The liquid, with which the optical path space of the exposure light is filled, can be prevented from leaking by means of the generated flow of the gas. According to a second aspect of the present invention, there is provided a method for producing a device; including exposing a substrate by using the exposure apparatus (EX) as defined in the foregoing aspect; developing the exposed substrate; and processing the developed substrate. According to the second aspect of the present invention, it is possible to produce the device by using the exposure apparatus wherein the liquid, with which the optical path space is filled, is prevented from leaking. According to a third aspect of the present invention, there is provided an exposure apparatus (EX) for exposing a substrate (P) by irradiating an exposure light (EL) onto the substrate (P) through a liquid (LQ); the exposure apparatus including a recovery port (422) which recovers the liquid (LQ); and a suction port (432) which is provided at the outside of the recovery port (422) with respect to an optical path space (K1) of the exposure light (EL) and which sucks only a gas. According to the third aspect of the present invention, a predetermined flow of the gas can be generated in the vicinity of the recovery port by sucking the gas from the suction port. It is possible to prevent the liquid from leaking by means of the generated flow of the gas. According to a fourth aspect of the present invention, there is provided a method for producing a device; including exposing a substrate by using the exposure apparatus (EX) as defined in the foregoing aspect; developing the exposed substrate; and processing the developed substrate. According to the fourth aspect of the present invention, it is possible to produce the device by using the exposure apparatus wherein the liquid, with which the optical path space is filled, is prevented from leaking. According to the present invention, the liquid, with which the optical path space of the exposure light is filled, can be prevented from leaking, and it is possible to maintain the exposure accuracy and the measurement accuracy. Continue reading about Exposure apparatus and method for producing device... Full patent description for Exposure apparatus and method for producing device Brief Patent Description - Full Patent Description - Patent Application Claims Click on the above for other options relating to this Exposure apparatus and method for producing device patent application. Patent Applications in related categories: 20090296053 - Apparatus and method for providing fluid for immersion lithography - A lithographic projection apparatus projects a pattern from a patterning device onto a substrate using a projection system. The apparatus has a liquid supply system to supply a liquid to a space between the projection system and the substrate. The apparatus also has a fluid removal system including a chamber ... 20090296054 - Immersion lithography method - An immersion lithography method includes preparing an exposure tool having an exposure stage, a projection lens having an immersion head movable on the stage and used to form an immersion region and an illumination light source provided on the projection lens via a mask, placing a to-be-exposed substrate on the ... 20090296055 - Lens heating compensation systems and methods - Methods for calibrating a photolithographic system are disclosed. A cold lens contour for a reticle design and at least one hot lens contour for the reticle design are generated from which a process window is defined. Aberrations induced by a lens manipulator are characterized in a manipulator model and the ... 20090296052 - Lithographic apparatus and methods - A system for cleaning a limited area of a top surface of a substrate table or an object positioned on a top surface of a substrate table is disclosed. The optical system used during normal imaging is adjusted to limit the cross-sectional area of a radiation beam to form a ... 20090296056 - Substrate table, lithographic apparatus and device manufacturing method - A table is disclosed in which measures are taken to seal between the table and an edge of an object, in use, supported on the table. In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence ... ###  How KEYWORD MONITOR works... a FREE service from FreshPatents1. Sign up (takes 30 seconds). 2. Fill in the keywords to be monitored. 3. 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