Reticle storage apparatus and semiconductor element storage apparatus

1. Technical Field

The present invention relates to reticle storage apparatuses and semiconductor element storage apparatuses and, more particularly, to a reticle storage apparatus and a semiconductor elements storage apparatus each equipped with a filtering device.

2. Description of Related Art

In the rapidly developing semiconductor technology, optical lithography plays an important role and wherever pattern definition is conducted, optical lithography is requisite. As to the application of optical lithography relating to semiconductors, a designed circuit pattern is used to produce a light-transparent reticle. Basing on the principle of exposure, after a light passes silicon wafer, the circuit pattern formed on the reticle can be exposed onto the silicon wafer. Since any dust (such as particles, powders or an organic matter) can adversely affect the quality of such projected pattern, the reticle used to produce the pattern on the silicon wafers is required with absolute cleanness. Thus, clean rooms are typically employed in general wafer processes for preventing particles in air from defiling reticles and wafers. However, absolute dustless environment is inaccessible even in known clean rooms.

Hence, reticle storage apparatuses that facilitate protecting reticles from defilement are implemented in current semiconductor processes for the purpose of storage and transportation of reticles so as to ensure cleanness of the reticles. When such reticle storage apparatuses accommodate reticles in semiconductor processes, the reticles can be isolated from the atmosphere when being transferred and conveyed between stations, so as to be secured from defilement caused by impurities that induces deterioration. Similarly, when semiconductor element storage apparatuses accommodate semiconductor elements in semiconductor processes, the semiconductor elements can be isolated from the atmosphere when being transferred and conveyed between stations, so as to be secured from defilement caused by impurities that induces deterioration. Further, in advanced semiconductor factories, the cleanliness of reticle storage apparatuses and semiconductor element storage apparatuses is required to meet Standard Mechanical Interface (SMIF), namely superior to Class 1. One solution for achieving the required cleanliness is to fill gas into reticle storage apparatuses and semiconductor element storage apparatuses.

However, for enhancing the yield of products and reducing manufacturing costs, in addition to meeting the required cleanliness, defilement that is brought to reticles by external gases has to be precluded. Besides the atmosphere, there are still two major resources of the gases that may cause defilement to reticles. One of them is outgasing generated by reticle storage apparatuses and semiconductor element storage apparatuses themselves that are made of macromolecular materials. The other is vapourised gas generated by trace chemical solutions remained on the surfaces of reticle storage apparatuses and semiconductor element storage apparatuses. These unexpected gases can cause foggy surfaces of reticles or semiconductor elements that render the reticles or semiconductor elements becoming rejects. While filling gas into reticle storage apparatuses and semiconductor element storage apparatuses is also a solution for preventing foggy surfaces thereof, it is an important task to maintain the cleanliness of the filled gas.

Therefore, the present invention provides a reticle storage apparatus and a semiconductor elements storage apparatus each equipped with a filtering device to improve the current technology.

To remedy the problem of the prior arts, the present invention provides a reticle storage apparatus and a semiconductor element storage apparatus each equipped with a filtering device. The reticle storage apparatus or the semiconductor element storage apparatus is constructed from a first cover and a second cover, which are assembled together to form an inner space therebetween for accommodating a reticle or a semiconductor element. The second cover of the reticle storage apparatus or the semiconductor element storage apparatus comprises at least one aperture for communicating the inner space and an exterior of the reticle storage apparatus or the semiconductor element storage apparatus and a filtering device for covering the aperture. The filtering device is constructed from a filter and a first portion, wherein the first portion has a through hole and a retaining mechanism for being fastened to an engaging mechanism on the second cover. The filter is settled on the first portion for filtering the dust and impurities in air. A fixing element may be further provided on the filtering device to fix the filter.

Thereupon, it is one objective of the present invention to provide a reticle storage apparatus and a semiconductor element storage apparatus each equipped with a filtering device to filter the dust in air so as to protect the reticles or semiconductor elements accommodated therein from being defiled.

It is another objective of the present invention to provide a reticle storage apparatus and a semiconductor element storage apparatus each equipped with a filtering device to filter the dust in air so as to maintain cleanliness of reticles or semiconductor elements accommodated therein.

BRIEF DESCRIPTION OF THE DRAWINGS

The invention as well as a preferred mode of use, further objectives and advantages thereof, will best be understood by reference to the following detailed description of an illustrative embodiment when read in conjunction with the accompanying drawings, wherein:

FIG. 1 is a perspective view of a reticle storage apparatus or a semiconductor element storage apparatus according to the present invention;

FIG. 2 is an exploded view of the reticle storage apparatus or the semiconductor element storage apparatus combined with a filtering device according to the present invention;

FIGS. 3A through 3F are schematic drawings showing the first portion engaged with an aperture on a body of the reticle storage apparatus or the semiconductor element storage apparatus according to the present invention;

FIG. 4 is a schematic drawing illustrating the reticle storage apparatus or the semiconductor element storage apparatus of the present invention combined with the filtering device;

FIGS. 5A through 5C are schematic drawings showing a first portion, the filter and a retainer in the reticle storage apparatus or the semiconductor element storage apparatus according to the present invention;

FIGS. 6A through 6B are schematic drawings showing the reticle storage apparatus or the semiconductor element storage apparatus combined with the filtering device according to the present invention in alternative ways; and

Continue reading about Reticle storage apparatus and semiconductor element storage apparatus...
Full patent description for Reticle storage apparatus and semiconductor element storage apparatus

Brief Patent Description - Full Patent Description - Patent Application Claims

Click on the above for other options relating to this Reticle storage apparatus and semiconductor element storage apparatus patent application.
###


How KEYWORD MONITOR works... a FREE service from FreshPatents
1. Sign up (takes 30 seconds). 2. Fill in the keywords to be monitored.
3. Each week you receive an email with patent applications related to your keywords.  
Start now! - Receive info on patent apps like Reticle storage apparatus and semiconductor element storage apparatus or other areas of interest.
###


Previous Patent Application:
Multiple compartment container
Next Patent Application:
Carrier tape structure
Industry Class:
Special receptacle or package

###

Design/code © 2009 FreshContext LLC/Freshpatents.com. Website Terms and Conditions - Also read: About this Page
Patent data source: patents published by the United States Patent and Trademark Office (USPTO)
Information published here is for research/educational purposes only (and in conjunction with our Keyword Monitor) and is not meant to be used in place of the full USPTO patent document/images or a comprehensive patent archive search. Complete official applications are on file at the USPTO and often contain additional data/images (Freshpatents is currently text-only). FreshPatents.com is not affiliated with or endorsed by the USPTO or firms/individuals or products/designs/ideas related to listed patents.

FreshPatents.com Support
Thank you for viewing the Reticle storage apparatus and semiconductor element storage apparatus patent info.
IP-related news and info


Results in 1.82247 seconds


Other interesting Feshpatents.com categories:
Qualcomm , Schering-Plough , Schlumberger , Seagate , Siemens , Texas Instruments , paws