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Focus blur measurement and control method




Title: Focus blur measurement and control method.
Abstract: A method for optimizing imaging and process parameter settings in a lithographic pattern imaging and processing system. The method includes correlating the dimensions of a first set of at least one control pattern printed in a lithographic resist layer, measured at three or more locations on or within the pattern which correspond to differing dose, defocus and blur sensitivity. The method then includes measuring the dimensions on subsequent sets of control patterns, printed in a lithographic resist layer, at three or more locations on or within each pattern, of which a minimum of three locations match those measured in the first set, and determining the effective dose, defocus and blur values associated with forming the subsequent sets of control patterns by comparing the dimensions at the matching locations with the correlated dependencies. ...


- New Haven, CT, US
USPTO Applicaton #: #20090011346

The Patent Description & Claims data below is from USPTO Patent Application 20090011346, Focus blur measurement and control method.

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stats Patent Info
Application #
US 20090011346 A1
Publish Date
01/08/2009
Document #
File Date
12/31/1969
USPTO Class
Other USPTO Classes
International Class
/
Drawings
0




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20090108|20090011346|focus blur measurement and control method|A method for optimizing imaging and process parameter settings in a lithographic pattern imaging and processing system. The method includes correlating the dimensions of a first set of at least one control pattern printed in a lithographic resist layer, measured at three or more locations on or within the pattern |
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